Product Display

Core performance:

• Resistant to plasma etching (CF4/O2 mixed gas)

• Temperature resistance range: -50 ℃~250 ℃ (instantaneous 300 ℃)

• Dynamic sealing life>1 million cycles

• Particle release amount<10 particles/ft ³ (0.1 μ m or more)

Application scenarios: wafer transfer chambers, etching machines, CVD/PVD equipment, vacuum gate valves for lithography machines.

Nico Rubber Door Valve Solution:

• Integrated seamless design: eliminates leakage hazards

•Self lubricating coating: reduces the generation of friction particles

•Quick exhaust structure: Shorten machine vacuum pumping time by 30%